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Suspension plasma technology for materials synthesis and coatings fabrication

发布时间: 2016-08-25 10:01 | 【 【打印】【关闭】

SEMINAR 

Key Laboratory of Inorganic Coating Materials, Chinese Academy of Sciences 

中国科学院特种无机涂层重点实验室 

  Suspension plasma technology for materials synthesis and coatings fabrication 

SpeakerProfessor François Gitzhofer, PhD 

Department of Chemical Engineering and Biotechnological Engineering, University of Sherbrooke, Canada 

时间:8月29日 (星期一)15:00 PM 

地点:长宁园区4号楼14楼第二会议室 

联系人:郑学斌 研究员 

        谢有桃 研究员  

  Abstract: The development of liquid injection (suspension or solution) in plasmas has enabled the  combinatorial inorganic chemistry. Following the success of this application of combinatorial techniques, such an approach has beenapplied to inorganic materials such as ceramic and alloys, especially for thin film coatings done by sputtering, molecular beam epitaxy and others. It was also possible to develop and apply the combinatorial approach to thermal plasma spraying.   

  Applications of this new technology are in various field such as advanced coatings for aerospace (thermal, oxydation, hardness improvement), catalysts (new generation of nanobased 2D catalysts), biomaterials and solid oxyde fuel cells. 

  Prof. François Gitzhofer, PhD (Full Professor, Department of Chemical Engineering and Biotechnological Engineering, UdeS) former vice-dean and secretary of the faculty of engineering is known worldwide for his expertise in materials synthesis using plasma technology. In materials synthesis, he invented Suspension Plasma Spraying [4]. This major breakthrough in plasma chemistry/plasma processing is becoming a standard, with entire conferences devoted to this research field. In his laboratory, a unique equipment has been built and devoted to suspension plasma technology and combinatorial inorganic materials synthesis, a new concept he also introduced. He is the only researcher in Canada who took part to 3 European framework programs consecutively (5-SOFCNET, 6-SAPHIR and 7-MARIE CURIE). 

  热烈欢迎科研人员和研究生参加!