Ablation mechanism of Cf /(Ti0.2 Zr0.2 Hf0.2 Nb0.2 Ta0.2 )C-SiC composite during plasma ablation above 20 0 0 °C--中国科学院上海硅酸盐研究所

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论文题目:

Ablation mechanism of Cf /(Ti0.2 Zr0.2 Hf0.2 Nb0.2 Ta0.2 )C-SiC composite during plasma ablation above 20 0 0 °C

作者:

Cai, Feiyan; Ni, Dewei; Zhou, Zhengyang; Chen, Bowen; Zou, Xuegang; Gao, Le; He, Ping; Ding, Yusheng; Zhang, Xiangyu; Dong, Shaoming

刊物名称:

JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY

发表年度:

2024

卷:

213

期:

页码: